TSMC’s A16 process to run without ASML’s next-gen High NA EUV machine
TSMC will not utilize ASML’s most advanced High NA EUV (high numerical aperture extreme ultraviolet) lithography ...
Read moreTSMC will not utilize ASML’s most advanced High NA EUV (high numerical aperture extreme ultraviolet) lithography ...
Read moreBeijing wants its own EUV light source, a key part of the chip supply chain – ...
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Novum Times is not responsible for the content of external sites.